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SUSS MicroTec

SUSS LI-Series – Laser Direct Imaging for maskless lithography

SUSS MicroTec introduces LI-Series Laser Direct Imager for high-resolution structuring processes and maskless lithography. With this system SUSS is focusing on MEMS, microfluidics and micro-optics applications. Using a GaN laser to write directly the system can be also used to produce photomasks for maskaligner. The laser beam scans the substrate surface and transfers the highly precise microstructures directly from the CAD software. Resolution is down to 0.8 ┬Ám and below. Capable for substrate dimensions from small pieces up to 300 mm.
Learn more about LI-Series


Events: Meet us!

July 20-21, 2016
Jordan, Amman
Meet us at International Conference on Engineering & Technology, Computer, Basic & Applied Sciences, LE ROYAL HOTELS & RESORTS, Amman, Jordan

September 4-7, 2016
Hungary, Budapest
Meet us at Eurosensors Conference

December 17-18, 2016
Saudi Arabia, Dammam
Meet us at IASTEM The 105th International Conference on Science Technology and Management ICSTM

March 20-23, 2017
UAE, Dubai
Meet us at ArabLab 2017

May, 8-9, 2017
Qatar, Doha
Meet us at LightingTech Qatar, City Centre Rotana Doha

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