SUSS LI-Series – Laser Direct Imaging for maskless lithography
SUSS MicroTec introduces LI-Series Laser Direct Imager for high-resolution structuring processes and maskless lithography. With this system SUSS is focusing on MEMS, microfluidics and micro-optics applications. Using a GaN laser to write directly the system can be also used to produce photomasks for maskaligner. The laser beam scans the substrate surface and transfers the highly precise microstructures directly from the CAD software. Resolution is down to 0.8 µm and below. Capable for substrate dimensions from small pieces up to 300 mm.
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